Microwave power coupling in a surface wave excited plasma

摘要

In recent decades, different types of plasma sources have been used forvarious types of plasma processing, such as, etching and thin film deposition.The critical parameter for effective plasma processing is high plasma density.One type of high density plasma source is Microwave sheath-Voltage combinationPlasma (MVP). In the present investigation, a better design of MVP source isreported, in which over-dense plasma is generated for low input microwavepowers. The results indicate that the length of plasma column increasessignificantly with increase in input microwave power.